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Process Support Engineer II – Semiconductor Equipment

amat · Yokkaichi

New
Onsite Mid 🇬🇧 English
Chemical Vapor Deposition Atomic Layer Deposition Plasma Reactive Ion Etch Physical Vapor Deposition Anneal Implant Design of Experiments Root cause analysis

Job description

About the role

As a Process Support Engineer II you will guide semiconductor equipment through its full lifecycle, from concept to qualification, providing on‑site customer support and troubleshooting complex process issues. You will work closely with customers and R&D teams to develop cutting‑edge processes for advanced chip manufacturing.

Key responsibilities

  • Perform on‑site installations, system diagnostics, service and repair of complex semiconductor equipment.
  • Collaborate with customers to develop and optimize processes for technologies such as Chemical Vapor Deposition, Atomic Layer Deposition, Plasma Reactive Ion Etch, Physical Vapor Deposition, Anneal and Implant.
  • Create hypothesis experiments and design of experiments (DOE), analyze data statistically, and compile detailed reports.
  • Troubleshoot difficult process engineering problems, conduct root‑cause analyses, and resolve customer product issues.
  • Communicate effectively with internal stakeholders and customers to build trust and achieve project goals.

Required profile

  • Bachelor’s degree in chemistry, physics, materials engineering, electrical engineering, optoelectronics or a related field.
  • 2–4 years of experience in the semiconductor fab or equipment industry.
  • Proficiency in English communication.
  • Preferred: Master’s degree or PhD in a related discipline.

Required skills

  • Knowledge of Chemical Vapor Deposition (CVD) processes.
  • Knowledge of Atomic Layer Deposition (ALD) processes.
  • Experience with Plasma Reactive Ion Etch (RIE) techniques.
  • Experience with Physical Vapor Deposition (PVD) methods.
  • Understanding of Anneal and Implant processes.
  • Design of Experiments (DOE) and statistical data analysis.
  • Root‑cause analysis and problem‑solving for semiconductor equipment.

Questions fréquentes

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Source : ats:workday

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Published 6日前

Expires 1ヶ月後

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amat

Yokkaichi